SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SAME

• Main Author: Chou, Chung Yen
• Format: Patent
• Language: English
• Published: 27.01.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A semiconductor structure and a method for manufacturing the same are provided. The manufacturing method includes: providing a semiconductor substrate having trench isolation layers and a plurality of active areas; removing a preset thickness of the trench isolation layers to form a plurality of openings which expose the upper parts of the active areas; forming additional layers on side walls of the exposed upper parts of the active areas; and forming filling isolation layers in the openings to fill the openings, the filling isolation layers and the retained trench isolation layers together constituting first shallow trench isolation structures.