PLASMA CLEANING METHODS FOR PROCESSING CHAMBERS

• Main Authors: VENKATASUBRAMANIAN, Eswaranand, PINSON, II, Jay D, ALAYAVALLI, Kaushik, WANG, Huiyuan, KUSTRA, Rick, MALLICK, Abhijit B
• Format: Patent
• Language: English
• Published: 09.12.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; TRANSPORTING

Embodiments of the present disclosure generally relate to clean methods for processing chambers, and more specifically relate to plasma clean methods for removing carbon films from surfaces within the processing chamber. A method for cleaning includes introducing a cleaning gas into a processing reg...