VALVE DEVICE, FLUID CONTROL SYSTEM, FLUID CONTROL METHOD, SEMICONDUCTOR MANUFACTURING SYSTEM, AND SEMICONDUCTOR MANUFACTURING METHOD

A valve device includes: a valve body that forms a first flow path and a second flow path; an inner disc that includes an inner annular part disposed around an opening of the first flow path, an outer annular part disposed on an outer peripheral side of the inner annular part, and a connecting part...

Full description

Saved in:
Bibliographic Details
Main Authors Miura, Takeru, Sato, Tatsuhiko, Nakata, Tomohiro, Shinohara, Tsutomu
Format Patent
LanguageEnglish
Published 28.10.2021
Subjects
ACTUATING-FLOATS
BLASTING
COCKS
DEVICES FOR VENTING OR AERATING
ENGINEERING ELEMENTS AND UNITS
GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS
HEATING
LIGHTING
MECHANICAL ENGINEERING
TAPS
THERMAL INSULATION IN GENERAL
VALVES
WEAPONS
Online AccessGet full text

Cover

More Information
Summary:A valve device includes: a valve body that forms a first flow path and a second flow path; an inner disc that includes an inner annular part disposed around an opening of the first flow path, an outer annular part disposed on an outer peripheral side of the inner annular part, and a connecting part that includes a plurality of openings that communicates with the second flow path and that connects the inner annular part and the outer annular part; a valve seat disposed on the inner annular part; and a diaphragm that, at a peripheral edge part of the diaphragm, comes into contact with the outer annular part and makes the first flow path and the second flow path continuous and discontinuous by moving between an open position of non-contact and a closed position of contact with the valve seat.
Bibliography:Application Number: US201916475931