CAPACITIVE SENSING DATA INTEGRATION FOR PLASMA CHAMBER CONDITION MONITORING

Capacitive sensors and capacitive sensing data integration for plasma chamber condition monitoring are described. In an example, a plasma chamber monitoring system includes a plurality of capacitive sensors, a capacitance digital converter, and an applied process server coupled to the capacitance di...

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Main Authors Taraboukhine, Mikhail V, Tae, Patrick John, Pan, Yaoling, Willwerth, Michael D, Tedeschi, Leonard, Shang, Kiyki-Shiy N, Nagarajan, Sivasankar, Hardy, Charles R
Format Patent
LanguageEnglish
Published 09.09.2021
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Summary:Capacitive sensors and capacitive sensing data integration for plasma chamber condition monitoring are described. In an example, a plasma chamber monitoring system includes a plurality of capacitive sensors, a capacitance digital converter, and an applied process server coupled to the capacitance digital converter, the applied process server including a system software. The capacitance digital converter includes an isolation interface coupled to the plurality of capacitive sensors, a power supply coupled to the isolation interface, a field-programmable gate-array firmware coupled to the isolation interface, and an application-specific integrated circuit coupled to the field-programmable gate-array firmware.
Bibliography:Application Number: US202016812081