SEMICONDUCTOR DEVICE

A resistance element includes a conductor, the conductor having a repeating pattern of: a first conductive layer formed on a first interlayer insulating layer on a semiconductor substrate; a second conductive layer formed on a second interlayer insulating layer different from the first interlayer in...

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Bibliographic Details
Main Authors TAWARA, Hidekazu, YAYAMA, Kosuke, HASHIMOTO, Chiemi
Format Patent
LanguageEnglish
Published 19.08.2021
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Summary:A resistance element includes a conductor, the conductor having a repeating pattern of: a first conductive layer formed on a first interlayer insulating layer on a semiconductor substrate; a second conductive layer formed on a second interlayer insulating layer different from the first interlayer insulating layer; and an interlayer conductive layer connecting the first conductive layer and the second conductive layer, and the second conductive layer has a resistance-value fluctuation characteristic opposite to a resistance-value fluctuation characteristic of the first conductive layer after a heat treatment.
Bibliography:Application Number: US202117154775