STAIN-RESISTANT BRANCHED POLYAMIDES

The present disclosure provides a polyamide composition and method of making a polyamide composition. The polyamide composition includes branched chains to provide for greater fiber tenacity and residues of a salt of 5-sulfoisophthalic or 5-sulfoisophthalic acid to provide excellent stain resistance...

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Bibliographic Details
Main Authors Weston, Joseph, Loy, David J, Strzelecki, Mary T, Talebi, Farzaneh, Nelliappan, Veera
Format Patent
LanguageEnglish
Published 19.08.2021
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Summary:The present disclosure provides a polyamide composition and method of making a polyamide composition. The polyamide composition includes branched chains to provide for greater fiber tenacity and residues of a salt of 5-sulfoisophthalic or 5-sulfoisophthalic acid to provide excellent stain resistance.
Bibliography:Application Number: US202117177182