FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS

• Main Authors: LEMPENS, Han Henricus Aldegonda, ULUCAN, Artunç, POLET, Theodorus Wilhelmus, GATTOBIGIO, Giovanni Luca, OLIESLAGERS, Ruud, MELMAN, Johannes Cornelis Paulus, YU, Miao, Wilhelmus SPRUYTENBURG, Patrick Johannes, EUMMELEN, Erik Henricus Egidius Catharina, ROPS, Cornelius Maria
• Format: Patent
• Language: English
• Published: 17.06.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.