EXTREME ULTRAVIOLET EXPOSURE SYSTEM

When the mask is attached, the electric field transmitted through the second region applies an attractive force or a repulsive force to charged particles in the exposure chamber.

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Bibliographic Details
Main Authors Kim, Sungyeol, JANG, Sungho, Bai, Keunhee, Lee, Injae, Shin, Hyuck
Format Patent
LanguageEnglish
Published 06.05.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:When the mask is attached, the electric field transmitted through the second region applies an attractive force or a repulsive force to charged particles in the exposure chamber.
Bibliography:Application Number: US202016880090