DRIP-FREE CLEANSING MASK WITH ENHANCED ACTIVE DEPOSITION

Cleansing mask composition are provided in the present disclosure. The cleansing mask compositions includes a) from about 0.4 to 9 wt. % of a first thickener chosen from non-acrylate base rheology modifier; b) from about 0.2 to about 2 wt. % of a second thickener chosen from acrylic- or acrylate bas...

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Bibliographic Details
Main Authors HARA, Ryuji, HALPERN CHIRCH, Susan, STEBBINS, Nicholas David
Format Patent
LanguageEnglish
Published 06.05.2021
Subjects
HUMAN NECESSITIES
HYGIENE
MEDICAL OR VETERINARY SCIENCE
PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES
SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS
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Summary:Cleansing mask composition are provided in the present disclosure. The cleansing mask compositions includes a) from about 0.4 to 9 wt. % of a first thickener chosen from non-acrylate base rheology modifier; b) from about 0.2 to about 2 wt. % of a second thickener chosen from acrylic- or acrylate based thickeners; c) from about 2 to 25 wt. % of at least one surfactant; d) a skin care active ingredient; and wherein the and is drip free once applied on the skin.
Bibliography:Application Number: US201916668494