ARTICLES INCLUDING METALLIZED VIAS
An article includes a wafer having a body which defines a first surface and a second surface. The wafer defines a via having a via surface extending between the first and second surfaces through the body. An adhesion layer is positioned on the via surface. At least a portion of the via surface is fr...
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Main Author | |
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Format | Patent |
Language | English |
Published |
25.03.2021
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Subjects | |
Online Access | Get full text |
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Summary: | An article includes a wafer having a body which defines a first surface and a second surface. The wafer defines a via having a via surface extending between the first and second surfaces through the body. An adhesion layer is positioned on the via surface. At least a portion of the via surface is free of the adhesion layer. A metallic component is positioned within the via and extends from the first surface to the second surface. |
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Bibliography: | Application Number: US202017111144 |