HIGH CONDUCTANCE LOWER SHIELD FOR PROCESS CHAMBER

Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes an annular ring configured to surround a substrate support; and an annular lip extending from an upper surface of the annular ring, wherein the annul...

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Bibliographic Details
Main Authors Wada, Yuichi, Boh, Kelvin, Babu, Sarath, Jupudi, Ananthkrishna, Wei, Junqi, Zhang, Kang, Ow, Yueh Sheng
Format Patent
LanguageEnglish
Published 04.03.2021
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:Embodiments of process kits for use in a process chamber are provided herein. In some embodiments, a process kit for use in a process chamber includes an annular ring configured to surround a substrate support; and an annular lip extending from an upper surface of the annular ring, wherein the annular ring includes a plurality of ring slots extending through the annular ring and disposed at regular intervals along the annular ring, and wherein the annular lip includes a plurality of lip slots extending through the annular lip disposed at regular intervals along the annular lip.
Bibliography:Application Number: US201916664155