IMPRINTING METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD

• Main Authors: Aoki, Akio, Hattori, Tadashi
• Format: Patent
• Language: English
• Published: 25.02.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

An imprinting method in which a pattern of an imprint material can be formed on a substrate while damage of a concave and convex pattern of a mold due to foreign particle is more reliably prevented is provided. An imprinting method of forming the pattern of the imprint material on the substrate using the mold includes: a supply step of supplying the imprint material on the substrate; a pattern forming step of forming the pattern of the imprint material by bringing an imprint material in a predetermined shot region on the substrate into contact with a concave and convex pattern of the mold after supplying the imprint material; and a foreign particle pressing step of pressing the foreign particle using a pressing surface of a pressing unit facing a surface of the substrate if the foreign particle is present on the surface of the substrate in a predetermined shot region, wherein the foreign particle pressing step is performed before the pattern forming step, and in the foreign particle pressing step, the foreign particle is pressed so that an amount of protrusion is smaller than a film thickness of the imprint material after the pattern forming step.