Preparation Method of Patterned Substrate
A method for preparing a patterned substrate includes selectively etching any one segment block of a self-assembled block copolymer from a laminate having a substrate; wherein a block copolymer membrane is formed on the substrate and the substrate contains the self-assembled block copolymer. Accordi...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
18.02.2021
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Subjects | |
Online Access | Get full text |
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Summary: | A method for preparing a patterned substrate includes selectively etching any one segment block of a self-assembled block copolymer from a laminate having a substrate; wherein a block copolymer membrane is formed on the substrate and the substrate contains the self-assembled block copolymer. According to the method, the self-assembled pattern of the block copolymer can be efficiently and accurately transferred on the substrate to prepare a patterened substate. |
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Bibliography: | Application Number: US201816642266 |