COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR FORMING RESIST PATTERN USING SAME

wherein R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is an -O- group, a -S- group, or a -S-S- group, and Ar is an arylene group.

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Bibliographic Details
Main Authors KISHIOKA, Takahiro, OGATA, Hiroto, TAMURA, Mamoru, USUI, Yuki
Format Patent
LanguageEnglish
Published 28.01.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
Online AccessGet full text

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Abstract wherein R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is an -O- group, a -S- group, or a -S-S- group, and Ar is an arylene group.
AbstractList wherein R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is an -O- group, a -S- group, or a -S-S- group, and Ar is an arylene group.
Author OGATA, Hiroto
KISHIOKA, Takahiro
TAMURA, Mamoru
USUI, Yuki
Author_xml – fullname: KISHIOKA, Takahiro
– fullname: OGATA, Hiroto
– fullname: TAMURA, Mamoru
– fullname: USUI, Yuki
BookMark eNrjYmDJy89L5WSId_b3DfAP9gzx9PdTcPMPAmFfTz93hSDXYM_gEIVQPxfXIB_HSFegjKePr4Kjn4uCr2uIh78LNtUBjiEhrkF-CqHBIMFgR19XHgbWtMSc4lReKM3NoOzmGuLsoZtakB-fWlyQmJyal1oSHxpsZGBkaGBkYmZh6WhoTJwqAJU1Nhc
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID US2021024689A1
GroupedDBID EVB
ID FETCH-epo_espacenet_US2021024689A13
IEDL.DBID EVB
IngestDate Fri Jul 19 14:48:14 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US2021024689A13
Notes Application Number: US202017070645
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210128&DB=EPODOC&CC=US&NR=2021024689A1
ParticipantIDs epo_espacenet_US2021024689A1
PublicationCentury 2000
PublicationDate 20210128
PublicationDateYYYYMMDD 2021-01-28
PublicationDate_xml – month: 01
  year: 2021
  text: 20210128
  day: 28
PublicationDecade 2020
PublicationYear 2021
RelatedCompanies NISSAN CHEMICAL INDUSTRIES, LTD
RelatedCompanies_xml – name: NISSAN CHEMICAL INDUSTRIES, LTD
Score 3.3070927
Snippet wherein R1 and R2 are each independently a C1-3 alkylene group or a single bond, Z is an -O- group, a -S- group, or a -S-S- group, and Ar is an arylene group.
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
Title COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR FORMING RESIST PATTERN USING SAME
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210128&DB=EPODOC&locale=&CC=US&NR=2021024689A1
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR3LSsNAcCj1edOq-KiyoOQWrHGTJocgaZK2keaBSaWeSh4rCJIWE_H3nV1T7UF62MPOLMPuwOzszM4D4IbSPNVeGZNVlioy1amBIkVTWcso7feUrK8UIso30MZT-jhTZy14X-XCiDqhX6I4IkpUjvJei_t6-efEckRsZXWbvSFo8TBMTEdqrGOFV6vSJWdgulHohLZk2-Y0loKnH5xCNd2w0Fbawod0nweAuc8DnpeyXFcqwwPYjpBeWR9Ci5Ud2LNXvdc6sOs3X94d2BExmnmFwEYOqyOY26EfhbHH_UsE7Tg-fC8YEeSnFydEpA5MrBcXMd7EJ1bgEN9NxqHz3-rISnhdXMJbcIxIbPnuMVwP3cQey7jn-S-L5tN4_YD3J9AuFyU7BVKoyHXNKO54zmjOenrWY4WBKqpQVY2mxhl0N1E634y-gH0-5S4JRe9Cu_74ZJeopOvsSvD2G5CejIU
link.rule.ids 230,309,783,888,25578,76884
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT8MwDLam8Rg3GCAeAyKBeqsYJe3aw4S6tlsLfYl2aJyqPoKEhLaJFfH3ccIGHNAOucSRlVhyHDv2Z4ArSstce2FMVlmuyFSnBqoUzWWtoLTXVYqeUoks31Bzx_R-ok4a8LaqhRE4oZ8CHBE1qkR9r8V9Pf8NYtkit3JxXbzi1OxumPZtaekdKxytSpfsQd-JIzuyJMvqjxMpfPymKVTTDRN9pQ18ZOscad95GvC6lPlfozLchc0Y-U3rPWiwaRta1qr3Whu2g-WXdxu2RI5mucDJpR4u9iGzoiCOEo_Hlwj6cXwEXjgiKE8vSYkoHfDNZwcpnh8QM7RJ4KRuZP-3OjZTjotLeAuOEUnMwDmAy6GTWq6Me85-RJSNk78HvD2E5nQ2ZUdAKhWlrhnVDa8ZLVlXL7qsMtBEVaqq0dw4hs46TifryRfQctPAz3wvfDiFHU7i4QlF70Czfv9gZ2iw6-JcyPkLUMGPdQ
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=COMPOSITION+FOR+FORMING+RESIST+UNDERLAYER+FILM+AND+METHOD+FOR+FORMING+RESIST+PATTERN+USING+SAME&rft.inventor=KISHIOKA%2C+Takahiro&rft.inventor=OGATA%2C+Hiroto&rft.inventor=TAMURA%2C+Mamoru&rft.inventor=USUI%2C+Yuki&rft.date=2021-01-28&rft.externalDBID=A1&rft.externalDocID=US2021024689A1