Method of inspecting a semiconductor processing chamber using a vision sensor, and method for manufaturing a semiconductor device using the same

• Main Authors: Kim, Byeongsang, Im, Sangil, Cho, Namyoung, LEE, TAEHYOUNG, Kim, Wooram, Lee, Keonho, Kim, Sung Chai, Yun, Kyungwon
• Format: Patent
• Language: English
• Published: 14.01.2021
• Subjects: BASIC ELECTRIC ELEMENTS; CALCULATING; COMPUTING; CONTROL OR REGULATING SYSTEMS IN GENERAL; CONTROLLING; COUNTING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS; PHYSICS; REGULATING; SEMICONDUCTOR DEVICES; TESTING

A method of inspecting a semiconductor processing chamber includes providing a vision sensor into the semiconductor processing chamber, aligning the vision sensor on a target in the semiconductor processing chamber, obtaining an object image of the target using an image scanning module of the vision sensor, generating a three dimensional model of the target based on the object image, and obtaining a physical quantity of the target from the three dimensional model. The obtaining of the object image of the target includes projecting a pattern onto the target using an illuminator of the image scanning module, and scanning an image of the target in which the pattern is projected, using a camera of the image scanning module.