SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

A support unit provided in an apparatus for treating a substrate using plasma includes a dielectric plate on which the substrate is placed, an electrode plate disposed under the dielectric plate, a power supply rod that applies power to the electrode plate, and a flange that has a shape surrounding...

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Bibliographic Details
Main Authors HAN, Yu Dong, KIM, Hyeon Gyu, SON, Hyoungkyu, KIM, Seon Ok
Format Patent
LanguageEnglish
Published 07.01.2021
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A support unit provided in an apparatus for treating a substrate using plasma includes a dielectric plate on which the substrate is placed, an electrode plate disposed under the dielectric plate, a power supply rod that applies power to the electrode plate, and a flange that has a shape surrounding the power supply rod and that is spaced apart from the power supply rod.
Bibliography:Application Number: US202016918299