FLOW CONTROL SYSTEM, METHOD, AND APPARATUS

A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and...

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Bibliographic Details
Main Authors Mudd, Daniel T, McIntyre, Zachariah Ezekiel, Batchelor, II, Norman L, Maeder, Michael, Mudd, Patti J, Kovacic, Matthew Eric, Davis, Christopher Bryant, Penley, Sean, Wright, Tyler James, Grill, Marshall B
Format Patent
LanguageEnglish
Published 07.01.2021
Subjects
ACTUATING-FLOATS
BLASTING
COCKS
CONTROLLING
DEVICES FOR VENTING OR AERATING
ENGINEERING ELEMENTS AND UNITS
GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS
HEATING
LIGHTING
MEASURING
MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL
MECHANICAL ENGINEERING
METERING BY VOLUME
PHYSICS
REGULATING
SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
TAPS
TESTING
THERMAL INSULATION IN GENERAL
VALVES
WEAPONS
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Summary:A mass flow control apparatus having a monolithic base. The monolithic base has a gas inlet, a gas outlet, a first flow component mounting region, a second flow component mounting region, and a third flow component mounting region. The first flow component mounting region has a first inlet port and a first outlet port, the first inlet port being fluidly coupled to the gas inlet of the monolithic base. The third flow component mounting region has a first sensing port fluidly coupled to the gas outlet of the monolithic base.
Bibliography:Application Number: US202017027333