BEAM-FORMING AND ILLUMINATING SYSTEM FOR A LITHOGRAPHY SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD
A beam-forming and illuminating system for a lithography system, such an EUV lithography system, includes an optical element and an adjusting device. The adjusting device is configured so that, during a heat-up phase of the beam-forming and illuminating system, the adjusting device measures a field...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
07.01.2021
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Subjects | |
Online Access | Get full text |
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Summary: | A beam-forming and illuminating system for a lithography system, such an EUV lithography system, includes an optical element and an adjusting device. The adjusting device is configured so that, during a heat-up phase of the beam-forming and illuminating system, the adjusting device measures a field position and/or a pupil position of the beam-forming and illuminating system and adjusts the orientation and/or position of the optical element based on the measured field position and/or pupil position to keep the optical element in a desired position. |
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Bibliography: | Application Number: US202017019931 |