SEMICONDUCTOR STRUCTURE WITH DOPED VIA PLUG

A semiconductor structure is provided. The semiconductor structure includes a gate structure over a fin structure. The semiconductor structure also includes a source/drain structure in the fin structure and adjacent to the gate structure. The semiconductor structure also includes a first contact plu...

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Main Authors HUANG, Jie-Huang, HUANG, Jing-Huei, CHEN, Liang-Yin, HSIEH, Tung-Po, TAN, Lun-Kuang, LIU, Hong-Chih, CHANG, Huicheng, LIU, Su-Hao, CHEN, Kuo-Ju
Format Patent
LanguageEnglish
Published 24.12.2020
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Abstract A semiconductor structure is provided. The semiconductor structure includes a gate structure over a fin structure. The semiconductor structure also includes a source/drain structure in the fin structure and adjacent to the gate structure. The semiconductor structure also includes a first contact plug over the source/drain structure. The semiconductor structure also includes a first via plug over the first contact plug. The semiconductor structure also includes a dielectric layer surrounding the first via plug. The first via plug includes a first group IV element and the dielectric layer includes the first group IV element and a second group IV element.
AbstractList A semiconductor structure is provided. The semiconductor structure includes a gate structure over a fin structure. The semiconductor structure also includes a source/drain structure in the fin structure and adjacent to the gate structure. The semiconductor structure also includes a first contact plug over the source/drain structure. The semiconductor structure also includes a first via plug over the first contact plug. The semiconductor structure also includes a dielectric layer surrounding the first via plug. The first via plug includes a first group IV element and the dielectric layer includes the first group IV element and a second group IV element.
Author TAN, Lun-Kuang
HSIEH, Tung-Po
LIU, Su-Hao
CHEN, Kuo-Ju
CHEN, Liang-Yin
HUANG, Jing-Huei
HUANG, Jie-Huang
LIU, Hong-Chih
CHANG, Huicheng
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– fullname: HSIEH, Tung-Po
– fullname: TAN, Lun-Kuang
– fullname: LIU, Hong-Chih
– fullname: CHANG, Huicheng
– fullname: LIU, Su-Hao
– fullname: CHEN, Kuo-Ju
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Snippet A semiconductor structure is provided. The semiconductor structure includes a gate structure over a fin structure. The semiconductor structure also includes a...
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SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title SEMICONDUCTOR STRUCTURE WITH DOPED VIA PLUG
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