PROCESSING SYSTEM FOR FORMING LAYERS
Embodiments of the present disclosure generally relate to a processing system for forming one or more layers of a photodiode. In one embodiment, the processing system includes a transfer chamber, a plurality of processing chambers, and a controller configured to cause a process to be performed in th...
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Main Authors | , , , , , , , , , |
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Format | Patent |
Language | English |
Published |
10.12.2020
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Subjects | |
Online Access | Get full text |
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Summary: | Embodiments of the present disclosure generally relate to a processing system for forming one or more layers of a photodiode. In one embodiment, the processing system includes a transfer chamber, a plurality of processing chambers, and a controller configured to cause a process to be performed in the processing system. The process includes performing a pre-clean process on a substrate, aligning and placing a first mask on the substrate, depositing a first layer on the substrate, and depositing a second layer on the substrate. The processing system can form layers of a photodiode in a low defect, cost effective, and high utilization manner. |
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Bibliography: | Application Number: US202016864949 |