Protection Devices with Trigger Devices and Methods of Formation Thereof
A method of forming a semiconductor device includes forming a first vertical protection device comprising a thyristor in a substrate, forming a first lateral trigger element for triggering the first vertical protection device in the substrate, and forming an electrical path in the substrate to elect...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
22.10.2020
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Subjects | |
Online Access | Get full text |
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Summary: | A method of forming a semiconductor device includes forming a first vertical protection device comprising a thyristor in a substrate, forming a first lateral trigger element for triggering the first vertical protection device in the substrate, and forming an electrical path in the substrate to electrically couple the first lateral trigger element with the first vertical protection device. |
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Bibliography: | Application Number: US202016919833 |