DETERMINING A CRITICAL DIMENSION VARIATION OF A PATTERN

A captured image of a pattern and a reference image of the pattern may be received. A contour of interest of the pattern may be identified. One or more measurements of a dimension of the pattern may be determined for each of the reference image and the captured image with respect to the contour of i...

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Bibliographic Details
Main Authors BAL, Evgeny, VERESCHAGIN, Vadim, SCHWARZBAND, Ishai, KRIS, Roman, COHEN, Boaz, SHKALIM, Ariel
Format Patent
LanguageEnglish
Published 15.10.2020
Subjects
CALCULATING
COMPUTING
COUNTING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
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Summary:A captured image of a pattern and a reference image of the pattern may be received. A contour of interest of the pattern may be identified. One or more measurements of a dimension of the pattern may be determined for each of the reference image and the captured image with respect to the contour of interest of the pattern. A defect associated with the contour of interest may be classified based on the determined one or more measurements of the dimension of the pattern for each of the reference image and the captured image.
Bibliography:Application Number: US201816652970