ALTERNATING HARDMASKS FOR TIGHT-PITCH LINE FORMATION

Methods of forming fins include masking a region on a three-color hardmask fin pattern, leaving a fin of a first color exposed. The exposed fin of the first color is etched away with a selective etch that does not remove fins of a second color or a third color. The mask and all fins of a second colo...

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Bibliographic Details
Main Authors Arnold, John C, Felix, Nelson M, Mignot, Yann A.M, Liu, Chi-Chun, DeSilva, Anuja E, Sieg, Stuart A
Format Patent
LanguageEnglish
Published 20.08.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Methods of forming fins include masking a region on a three-color hardmask fin pattern, leaving a fin of a first color exposed. The exposed fin of the first color is etched away with a selective etch that does not remove fins of a second color or a third color. The mask and all fins of a second color are etched away. Fins are etched into a fin base layer using the fins of the first color and the fins of the third color.
Bibliography:Application Number: US202016798823