SUBSTRATE PROCESSING APPARATUS

A substrate processing apparatus includes a placing table, having a placing surface on which a processing target substrate is placed, provided with a gas supply line through which a heat transfer gas is supplied into a gap between the processing target substrate and the placing surface; and a gas su...

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Bibliographic Details
Main Author Makabe, Masatsugu
Format Patent
LanguageEnglish
Published 30.07.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A substrate processing apparatus includes a placing table, having a placing surface on which a processing target substrate is placed, provided with a gas supply line through which a heat transfer gas is supplied into a gap between the processing target substrate and the placing surface; and a gas supply system configured to generate the heat transfer gas to be supplied into the gap between the processing target substrate and the placing surface through the gas supply line by mixing a heat transfer gas having a relatively low temperature and a heat transfer gas having a relatively high temperature.
Bibliography:Application Number: US202016774066