LOADLOCK INTEGRATED BEVEL ETCHER SYSTEM

Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etc...

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Main Authors PONNEKANTI, Hari K, NARASIMHA, Karthik Thimmavajjula, ZHOU, Jianhua, WAQAR, Mohsin, DU BOIS, Dale R, GILBERT, Rick, OGISO, Hiroyuki, BERENS, Brett, LEE, Jeongmin, GHOSH, Kalyanjit, BASU, Saptarshi, ROCHA-ALVAREZ, Juan Carlos, KULSHRESHTHA, Prashant Kumar, BALASUBRAMANIAN, Ganesh, LEE, Kwangduk Douglas, KRIVULINA, Liliya, CONNORS, Paul, SHANKARAMURTHY, Venkatanarayana
Format Patent
LanguageEnglish
Published 23.07.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Abstract Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.
AbstractList Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.
Author GHOSH, Kalyanjit
WAQAR, Mohsin
LEE, Jeongmin
ZHOU, Jianhua
SHANKARAMURTHY, Venkatanarayana
LEE, Kwangduk Douglas
BASU, Saptarshi
KRIVULINA, Liliya
CONNORS, Paul
GILBERT, Rick
BERENS, Brett
BALASUBRAMANIAN, Ganesh
PONNEKANTI, Hari K
KULSHRESHTHA, Prashant Kumar
OGISO, Hiroyuki
ROCHA-ALVAREZ, Juan Carlos
NARASIMHA, Karthik Thimmavajjula
DU BOIS, Dale R
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– fullname: DU BOIS, Dale R
– fullname: GILBERT, Rick
– fullname: OGISO, Hiroyuki
– fullname: BERENS, Brett
– fullname: LEE, Jeongmin
– fullname: GHOSH, Kalyanjit
– fullname: BASU, Saptarshi
– fullname: ROCHA-ALVAREZ, Juan Carlos
– fullname: KULSHRESHTHA, Prashant Kumar
– fullname: BALASUBRAMANIAN, Ganesh
– fullname: LEE, Kwangduk Douglas
– fullname: KRIVULINA, Liliya
– fullname: CONNORS, Paul
– fullname: SHANKARAMURTHY, Venkatanarayana
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Snippet Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus...
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SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title LOADLOCK INTEGRATED BEVEL ETCHER SYSTEM
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