LOADLOCK INTEGRATED BEVEL ETCHER SYSTEM

Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etc...

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Main Authors PONNEKANTI, Hari K, NARASIMHA, Karthik Thimmavajjula, ZHOU, Jianhua, WAQAR, Mohsin, DU BOIS, Dale R, GILBERT, Rick, OGISO, Hiroyuki, BERENS, Brett, LEE, Jeongmin, GHOSH, Kalyanjit, BASU, Saptarshi, ROCHA-ALVAREZ, Juan Carlos, KULSHRESHTHA, Prashant Kumar, BALASUBRAMANIAN, Ganesh, LEE, Kwangduk Douglas, KRIVULINA, Liliya, CONNORS, Paul, SHANKARAMURTHY, Venkatanarayana
Format Patent
LanguageEnglish
Published 23.07.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Implementations disclosed herein describe a bevel etch apparatus within a loadlock bevel etch chamber and methods of using the same. The bevel etch apparatus has a mask assembly within the loadlock bevel etch chamber. During an etch process, the mask assembly delivers a gas flow to control bevel etch without the use of a shadow frame. As such, the edge exclusion at the bevel edge can be reduced, thus increasing product yield.
Bibliography:Application Number: US202016838128