HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer including a structural unit represented by Chemical Formula 1,wherein, in Chemical Formula 1, A is a substituted or unsubstituted dihydroxypyrene moiety, and E is a substitu...

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Bibliographic Details
Main Authors PARK, Hyungseok, KIM, Sunghwan, KIM, Seunghyun, PARK, Yushin, JUNG, Hyeonil
Format Patent
LanguageEnglish
Published 02.07.2020
Subjects
ADHESIVES
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
CINEMATOGRAPHY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
ELECTROGRAPHY
FILLING PASTES
HOLOGRAPHY
INKS
MATERIALS THEREFOR
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORIGINALS THEREFOR
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
POLISHES
USE OF MATERIALS THEREFOR
WOODSTAINS
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Summary:A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer including a structural unit represented by Chemical Formula 1,wherein, in Chemical Formula 1, A is a substituted or unsubstituted dihydroxypyrene moiety, and E is a substituted or unsubstituted pyrenyl group.
Bibliography:Application Number: US201916725191