LITHOGRAPHY APPARATUS COMPRISING A PLURALITY OF INDIVIDUALLY CONTROLLABLE WRITE HEADS

• Main Authors: Doering, Dirk, Richter, Stefan, Voelcker, Martin, Geissler, Enrico, Rudolph, Guenter, Kumar, Lakshmanan Senthil, Deguenther, Markus
• Format: Patent
• Language: English
• Published: 28.05.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; ELECTROGRAPHY; HOLOGRAPHY; MACHINE TOOLS; MATERIALS THEREFOR; METAL-WORKING NOT OTHERWISE PROVIDED FOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SOLDERING OR UNSOLDERING; TRANSPORTING; WELDING; WORKING BY LASER BEAM

The disclosure relates to a lithography apparatus for writing to substrate wafers. The apparatus includes: a light generating device including one or a plurality of light sources for generating light; a writing device; a light transferring device including a number of optical waveguides for transferring the light from the light generating device to a writing device, the writing device including a plurality of individually controllable write heads for projecting the light from the one or the plurality of light sources in different regions of a substrate wafer; a transport device for moving the substrate wafer relative to the writing device in a predefined transport direction; and a control device for controlling the writing process on the substrate wafer.