Method for of Measuring a Focus Parameter Relating to a Structure Formed Using a Lithographic Process
Disclosed is a method of measuring a focus parameter relating to formation of a structure using a lithographic process, and associated metrology device. The method comprises obtaining measurement data relating to a cross-polarized measurement of said structure; and determining a value for said focus...
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Format | Patent |
Language | English |
Published |
28.05.2020
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Abstract | Disclosed is a method of measuring a focus parameter relating to formation of a structure using a lithographic process, and associated metrology device. The method comprises obtaining measurement data relating to a cross-polarized measurement of said structure; and determining a value for said focus parameter based on the measurement data. |
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AbstractList | Disclosed is a method of measuring a focus parameter relating to formation of a structure using a lithographic process, and associated metrology device. The method comprises obtaining measurement data relating to a cross-polarized measurement of said structure; and determining a value for said focus parameter based on the measurement data. |
Author | SOKOLOV, Sergei LI, Fahong |
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Snippet | Disclosed is a method of measuring a focus parameter relating to formation of a structure using a lithographic process, and associated metrology device. The... |
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SubjectTerms | MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING |
Title | Method for of Measuring a Focus Parameter Relating to a Structure Formed Using a Lithographic Process |
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