SYSTEM AND METHOD FOR LIMITING LASER EXPOSURE OF ARBITRARY LASER TEMPLATE PROJECTION

A laser projection system for projecting laser image onto a work surface providing optimized laser energy includes laser source and an electronic circuit for modulating an output power level. A galvanometer assembly includes a scanning mirror operated a mirror control circuit for redirecting the las...

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Bibliographic Details
Main Author Rueb, Kurt D
Format Patent
LanguageEnglish
Published 21.05.2020
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:A laser projection system for projecting laser image onto a work surface providing optimized laser energy includes laser source and an electronic circuit for modulating an output power level. A galvanometer assembly includes a scanning mirror operated a mirror control circuit for redirecting the laser beam onto the work surface along a scanning path for generating the laser image. The galvanometer assembly is electronically connected to the electronic circuit for signaling an angular velocity of the scanning mirror to the electronic circuit. A controller includes a scanning path input module for generating a simulation of the angular velocity of the scanning mirror along the scanning path for estimating a concentration of laser energy along areas of the scanning path of the laser beam. The electronic circuit modulates energy concentration of the laser beam in response to the estimated concentration of laser energy and the angular velocity of the scanning mirror.
Bibliography:Application Number: US201916685506