PATTERN PART, METHOD FOR FORMING PATTERN PART AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING SAME
A method of forming a pattern part includes forming a first film on a target object, the first film having a first cure shrinkage ratio, forming a second film on the first film, the second film having a second cure shrinkage ratio greater than the first cure shrinkage ratio, and patterning the first...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
14.05.2020
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Subjects | |
Online Access | Get full text |
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Summary: | A method of forming a pattern part includes forming a first film on a target object, the first film having a first cure shrinkage ratio, forming a second film on the first film, the second film having a second cure shrinkage ratio greater than the first cure shrinkage ratio, and patterning the first film and the second film to form a pattern. |
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Bibliography: | Application Number: US201916662712 |