ETCHING COMPOSITION, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING A DISPLAY DEVICE USING THE SAME

An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.

Saved in:
Bibliographic Details
Main Authors SHIN, Hyun-Cheol, LEE, Dae-Woo, KIM, Gyu-Po, PARK, Jonghee, KIM, Jinseock, HONG, Zheng, KIM, Kitae, LEE, Sang-Hyuk
Format Patent
LanguageEnglish
Published 14.05.2020
Subjects
ADHESIVES
CHEMISTRY
DYES
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
Online AccessGet full text

Cover

More Information
Summary:An etching composition includes an inorganic acid compound, a carboxylic acid compound, a sulfonic acid compound, a glycol compound, a nitrogen-containing dicarbonyl compound, a sulfate compound and water.
Bibliography:Application Number: US201916579073