EVAPORATION DEVICE FOR A VACUUM EVAPORATION SYSTEM, APPARATUS AND METHOD FOR DEPOSITING A FILM OF MATERIAL

• Main Authors: ROUSSEAU, Youri, STEMMELEN, Franck, GUYAUX, Jean-Louis
• Format: Patent
• Language: English
• Published: 07.05.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Disclosed is an evaporation device including an evaporation cell including heating element and a crucible having an upper open end and a lower closed bottom, intended to receive a load, the device being adapted to generate a flow of vapour-phase material by evaporation or sublimation of the load material. The evaporation device includes a filtering insert including an upper part having a conical opening intended to be placed at the open end of the crucible, and a lower part including, from the top to the bottom, a plate having at least one opening and one grid, the lower part being intended to be placed in the crucible between the upper part and the load. Also disclosed is an apparatus and a method for depositing a film of material on a substrate.