METHOD AND DEVICE FOR TREATING SUBSTRATES

A device treats substrates with a liquid, which device has a conveying device by which the substrates can be conveyed in a conveying direction through a container containing a liquid. A weir has an edge over which the substrates can run and which, at least in sections, extends obliquely relative to...

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Bibliographic Details
Main Authors Uihlein, Markus, Pediaditakis, Stephan Alexis, Hansen, Stefan-Heinrich, Sander, Bernd-Uwe
Format Patent
LanguageEnglish
Published 26.03.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A device treats substrates with a liquid, which device has a conveying device by which the substrates can be conveyed in a conveying direction through a container containing a liquid. A weir has an edge over which the substrates can run and which, at least in sections, extends obliquely relative to the conveying direction of the substrates. The weir is used in the device for treating substrates with a liquid. The weir has at least one edge which extends obliquely at least in sections.
Bibliography:Application Number: US201916695603