SUBSTRATES AND METHODS OF USING THOSE SUBSTRATES

A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chem...

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Bibliographic Details
Main Authors SCHOLTEN, Bert Dirk, LIPSON, Matthew, SOHRABIBABAHEIDARY, Damoon, VAN DE WINKEL, Jimmy Matheus Wilhelmus, MASON, Christopher John
Format Patent
LanguageEnglish
Published 05.03.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
CLEANING
CLEANING IN GENERAL
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PREVENTION OF FOULING IN GENERAL
TRANSPORTING
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Summary:A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
Bibliography:Application Number: US201816610103