Optically-Finished Thin Diamond Substrate or Window of High Aspect Ratio and a Method of Production Thereof
In a method of forming a diamond film, substrate, or window, a substrate is provided and the diamond film, substrate, or window is CVD grown on a surface of the substrate. The grown diamond film, substrate, or window has a thickness between 150-999 microns and an aspect ratio≥100, wherein the aspect...
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
05.03.2020
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Subjects | |
Online Access | Get full text |
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Summary: | In a method of forming a diamond film, substrate, or window, a substrate is provided and the diamond film, substrate, or window is CVD grown on a surface of the substrate. The grown diamond film, substrate, or window has a thickness between 150-999 microns and an aspect ratio≥100, wherein the aspect ratio is a ratio of a largest dimension of the diamond film, substrate or window divided by a thickness of the diamond film. The substrate can optionally be removed or separated from the grown diamond film, substrate, or window. |
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Bibliography: | Application Number: US201916663423 |