LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD

The present invention relates to a lithographic apparatus, comprising: - a projection system configured to project a patterned radiation beam onto a substrate, comprising optical elements, - a sensor frame, - a first position measurement system configured to measure a position of an optical element...

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Bibliographic Details
Main Authors WIJCKMANS, Maurice Willem Jozef Etiënne, BUTLER, Hans
Format Patent
LanguageEnglish
Published 13.02.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention relates to a lithographic apparatus, comprising: - a projection system configured to project a patterned radiation beam onto a substrate, comprising optical elements, - a sensor frame, - a first position measurement system configured to measure a position of an optical element relative to the sensor frame, comprising a sensor adapted to monitor an optical element, with a sensor element mounted to the sensor frame, - a sensor frame support supporting the sensor frame on a reference, - a force measurement device adapted to generate force measurement data relating to force exerted on the sensor frame by the sensor frame support, - a position control device adapted to control the relative position of the substrate and the patterned radiation beam wherein the position control device is configured to receive the force measurement data and to control said relative position based on at least the force measurement data.
Bibliography:Application Number: US201816482515