COMPOUND SEMICONDUCTOR MONOLITHIC INTEGRATED CIRCUIT DEVICE WITH TRANSISTORS AND DIODES

A compound semiconductor monolithically integrated circuit device with transistors and diodes comprises a compound semiconductor substrate, a transistor epitaxial structure, a transistor upper structure, a first diode, and a second diode. The transistor epitaxial structure forms on the compound semi...

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Bibliographic Details
Main Authors LIU, Sheng-Hsien, LIN, Hsi-Tsung, LIN, Yan-Cheng
Format Patent
LanguageEnglish
Published 09.01.2020
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Summary:A compound semiconductor monolithically integrated circuit device with transistors and diodes comprises a compound semiconductor substrate, a transistor epitaxial structure, a transistor upper structure, a first diode, and a second diode. The transistor epitaxial structure forms on the compound semiconductor substrate. The first diode, the second diode, and the transistor upper structure form on a first part, a second part, and a third part of the transistor epitaxial structure, respectively. The transistor upper structure and the third part of the transistor epitaxial structure form a transistor. The first diode comprises a first part of an n-type doped epitaxial layer, a first part of a first intrinsic epitaxial layer, a first electrode, and a second electrode. The second diode comprises a second part of the n-type doped epitaxial layer, a second part of the first intrinsic epitaxial layer, a first electrode, and a second electrode.
Bibliography:Application Number: US201916291572