SUBSTRATE PROCESSING APPARATUS AND NOZZLE UNIT
An apparatus for processing a substrate compries a processing vessel having a processing space inside, a substrate support unit that supports and rotates the substrate in the processing vessel, and a nozzle unit that dispenses a processing liquid onto the substrate. The nozzle unit compries a nozzle...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
09.01.2020
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Subjects | |
Online Access | Get full text |
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Summary: | An apparatus for processing a substrate compries a processing vessel having a processing space inside, a substrate support unit that supports and rotates the substrate in the processing vessel, and a nozzle unit that dispenses a processing liquid onto the substrate. The nozzle unit compries a nozzle that dispenses the processing liquid and an ultraviolet (UV) light supply unit that emits UV light to activate radicals of the processing liquid dispensed onto the substrate. |
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Bibliography: | Application Number: US201916502272 |