QUANTUM DOT FILM HAVING POROUS STRUCTURE AND MANUFACTURING METHOD FOR THE SAME

The present disclosure relates to a quantum dot film including a self-assembled block copolymer, and a quantum dot bonded to the block copolymer, wherein the film has pores with an average diameter of 100-3000 nm inside.

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Bibliographic Details
Main Authors Jung, Yeon Sik, Choi, Jin Young, Lee, Chul Hee, Kim, Geon Yeong, Lim, Hun Hee, Jeon, Duk Young
Format Patent
LanguageEnglish
Published 12.12.2019
Subjects
ELECTRICITY
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Summary:The present disclosure relates to a quantum dot film including a self-assembled block copolymer, and a quantum dot bonded to the block copolymer, wherein the film has pores with an average diameter of 100-3000 nm inside.
Bibliography:Application Number: US201816212798