OPTOELECTRONIC FOIL AND MANUFACTURING METHOD OF OPTOELECTRONIC FOIL

• Main Authors: Malinkiewicz, Olga, Prieto Ruiz, Juan Pablo, Kupczunas, Artur, WOJCIECHOWSKI, Konrad, Bursa, Bartosz, Wilk, Barbara
• Format: Patent
• Language: English
• Published: 14.11.2019
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; FREQUENCY-CHANGING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

An optoelectronic foil comprising a substrate and a conductive layer comprising at least one oxide layer and at least one metal layer, wherein between the conductive layer and the substrate of the foil there is a barrier layer comprising at least one material selected from the group consisting of silicon oxides (SiOx), aluminium oxides (Al2O3, AlOxNy), titanium oxides (TiOx), silicon oxynitrides SiON, silicon nitrides (Si3N4, SiNx), organic silicon compounds (SiCxHy), zirconium oxide (ZrO2), hafnium oxide (HfO2), chromium oxides (CrO, Cr2O3, CrO2, CrO3, CrO5) and parylene.