FORMATION OF TALL METAL PILLARS USING MULTIPLE PHOTORESIST LAYERS

An apparatus system is provided which comprises: a substrate; a metal pillar formed on the substrate, the metal pillar comprising a first section and a second section, wherein the first section of the metal pillar is formed by depositing metal in a first opening of a first photoresist layer, and whe...

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Bibliographic Details
Main Authors Cheng, Liwei, Chavali, Sri Chaitra J, Li, Sheng, Alur, Siddharth K
Format Patent
LanguageEnglish
Published 24.10.2019
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:An apparatus system is provided which comprises: a substrate; a metal pillar formed on the substrate, the metal pillar comprising a first section and a second section, wherein the first section of the metal pillar is formed by depositing metal in a first opening of a first photoresist layer, and wherein the second section of the metal pillar is formed by depositing metal in a second opening of a second photoresist layer.
Bibliography:Application Number: US201716473599