METHOD OF REDUCING EFFECTS OF RETICLE HEATING AND/OR COOLING IN A LITHOGRAPHIC PROCESS
A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the litho...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
24.10.2019
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Subjects | |
Online Access | Get full text |
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Summary: | A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle. |
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Bibliography: | Application Number: US201916458601 |