REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical ph...

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Bibliographic Details
Main Authors op 't Root, Wilhelmus Patrick Elisabeth Maria, Thornes, Joshua Jon, Godfried, Herman Philip, King, Brian Edward, Everts, Frank, Duffey, Thomas Patrick
Format Patent
LanguageEnglish
Published 24.10.2019
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Summary:A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
Bibliography:Application Number: US201916503073