METHOD FOR MIXING GAS-FREE LIQUID OXIDANT WITH PROCESS LIQUID

Disclosed are systems and methods for mixing a gas-free liquid oxidant with a process liquid to form a homogeneous and gas-free mixture with minimized degassing. The mixing system comprises an injection device, integrating with a pipe through which a process liquid flows, configured and adapted to i...

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Bibliographic Details
Main Authors Rasanayagam, Vasuhi, Joy, Midhun, Mante, Jan
Format Patent
LanguageEnglish
Published 03.10.2019
Subjects
CHEMISTRY
METALLURGY
MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
TRANSPORTING
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Summary:Disclosed are systems and methods for mixing a gas-free liquid oxidant with a process liquid to form a homogeneous and gas-free mixture with minimized degassing. The mixing system comprises an injection device, integrating with a pipe through which a process liquid flows, configured and adapted to inject a gas-free liquid oxidant into the process liquid, and a mixer, fluidly connected to the pipe and the injection device, configured and adapted to mix the process liquid and the gas-free liquid oxidant therein to form a homogeneous and gas-free mixture of the process liquid and the gas-free liquid oxidant with minimal degassing. The method comprises the steps of a). injecting the gas-free liquid oxidant into the process liquid, and b). mixing the gas-free liquid oxidant and the process liquid to form the homogeneous and gas-free mixture. The gas-free liquid oxidant is ozone strong water.
Bibliography:Application Number: US201815938870