GUIDED INSPECTION OF A SEMICONDUCTOR WAFER BASED ON SPATIAL DENSITY ANALYSIS
Samples at a semiconductor wafer that have been reviewed by a review tool may be identified. Furthermore, a candidate sample at the semiconductor wafer that has not been reviewed by the review tool may be identified. A location of the candidate sample at the semiconductor wafer may and a number of t...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
26.09.2019
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Subjects | |
Online Access | Get full text |
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Summary: | Samples at a semiconductor wafer that have been reviewed by a review tool may be identified. Furthermore, a candidate sample at the semiconductor wafer that has not been reviewed by the review tool may be identified. A location of the candidate sample at the semiconductor wafer may and a number of the samples that have been reviewed that are at locations proximate to the location of the candidate sample may be determined. The candidate sample may be selected for review by the review tool based on the number of the plurality of samples that are at locations proximate to the location of the candidate sample. |
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Bibliography: | Application Number: US201815926990 |