METHODS AND SYSTEM FOR CONTROLLING A SURFACE PROFILE OF A WAFER

Methods for controlling the surface profiles of wafers sliced from an ingot with a wire saw include measuring an amount of displacement of a sidewall of a frame of the wire saw. The sidewall is connected to a bearing of a wire guide supporting a wire web in the wire saw. Based on the measured amount...

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Bibliographic Details
Main Authors Albrecht, Peter D, Zavattari, Carlos, Bhagavat, Sumeet S, Hermes, Uwe, Tanna, Vandan
Format Patent
LanguageEnglish
Published 05.09.2019
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Summary:Methods for controlling the surface profiles of wafers sliced from an ingot with a wire saw include measuring an amount of displacement of a sidewall of a frame of the wire saw. The sidewall is connected to a bearing of a wire guide supporting a wire web in the wire saw. Based on the measured amount of displacement of the sidewall, a pressure profile for adjusting a position of the sidewall is determined by a computing device. Pressure is applied to the sidewall using a displacement device according to the determined pressure profile to control the position of the sidewall.
Bibliography:Application Number: US201916414238