LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

• Main Authors: LOOPSTRA, Erik Roelof, KROON, Mark, SIMON, Klaus, HOOGENDAM, Christiaan Alexander, VAN SANTEN, Helmar, KOLESNYCHENKO, Aleksey Yurievich, OTTENS, Joost Jeroen, BUTLER, Hans, STRAAIJER, Alexander, VAN SCHAIK, Frank, SENGERS, Timotheus Franciscus, RITSEMA, Roelof Aeilko Siebrand, BIJLAART, Erik Theodorus Maria, STREEFKERK, Bob, MEIJER, Hendricus Johannes Maria, MULKENS, Johannes Catherinus Hubertus, DE SMIT, Joannes Theodoor, DEN BOEF, Arie Jeffrey, VAN DE KERKHOF, Marcus Adrianus, LOF, Joeri, DONDERS, Sjoerd Nicolaas Lambertus, MERTENS, Jeroen Johannes Sophia Maria
• Format: Patent
• Language: English
• Published: 15.08.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.