Multi-Mask Alignment System and Method
In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask-frame combinations are also provided. Each shadow mask-frame combination includes a first set of alignment features and each shadow mask-frame combination is po...
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Main Author | |
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Format | Patent |
Language | English |
Published |
25.07.2019
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Subjects | |
Online Access | Get full text |
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Summary: | In a multi-mask alignment system and method, a carrier frame is provided having a number of apertures therethrough. A number of shadow mask-frame combinations are also provided. Each shadow mask-frame combination includes a first set of alignment features and each shadow mask-frame combination is positioned on a first side of the carrier with the frame supporting the shadow mask in alignment with one of the apertures. A single alignment stage is provided and a control system including a programmed controller is also provided. Under the control of the controller, the single alignment stage translates to each shadow mask-frame combination, one-at-a time, and adjusts the position of the shadow mask-frame combination based on positions of the first set of alignment features determined by the controller. |
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Bibliography: | Application Number: US201916371588 |