SEGMENTED SILICONE POLYAMIDE BLOCK COPOLYMERS AND ARTICLES CONTAINING THE SAME

Segmented silicone polyamide block copolymers that comprise dimer acid residues and articles containing the same.

Saved in:
Bibliographic Details
Main Authors KUMAR, Ramesh C, HACKBARTH, Timothy M, Hays, David S, SEVERANCE, Joseph A, KALGUTKAR, Rajeep S
Format Patent
LanguageEnglish
Published 25.07.2019
Subjects
ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE
ADHESIVES
CHEMISTRY
COMPOSITIONS BASED THEREON
DYES
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
PERFORMING OPERATIONS
POLISHES
THEIR PREPARATION OR CHEMICAL WORKING-UP
TRANSPORTING
USE OF MATERIALS AS ADHESIVES
Online AccessGet full text

Cover

More Information
Summary:Segmented silicone polyamide block copolymers that comprise dimer acid residues and articles containing the same.
Bibliography:Application Number: US201716317639